The role of oxygen-related defects and hydrogen impurities in HfO2 and ZrO2
- 31 July 2011
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 88 (7), 1452-1456
- https://doi.org/10.1016/j.mee.2011.03.099
Abstract
No abstract availableKeywords
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