Photoelectrochemical investigations of thin metal-oxide films: TiO2, Al2O3, and HfO2 on the parent metals
- 31 January 1993
- journal article
- Published by Elsevier BV in Electrochimica Acta
- Vol. 38 (1), 15-27
- https://doi.org/10.1016/0013-4686(93)80005-k
Abstract
No abstract availableKeywords
This publication has 46 references indexed in Scilit:
- Photoelectrochemical Measurements of Thin Oxide Films: Multiple Internal Reflection EffectsJournal of the Electrochemical Society, 1992
- Photoelectrochemical spectroscopy studies of titanium dioxide surfaces: theory and experimentSurface Science, 1991
- Local film thickness and photoresponse of thin anodic TiO2 films on polycrystalline titaniumElectrochimica Acta, 1989
- Photoelectrochemical microscopy of oxide films on metals: Ti/TiO2 interfaceSurface Science, 1988
- Photoelectrochemical microscopy as a probe of localized properties of thin TiO2 filmsJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1987
- The current-voltage characteristics of semiconductor-electrolyte junction photovoltaic cellsApplied Physics Letters, 1980
- Photocharacteristics for Electrolyte‐Semiconductor JunctionsJournal of the Electrochemical Society, 1978
- A model for the current-voltage curve of photoexcited semiconductor electrodesJournal of Applied Physics, 1977
- Photoelectrolysis and physical properties of the semiconducting electrode WO2Journal of Applied Physics, 1977
- Depletion-Layer Photoeffects in SemiconductorsPhysical Review B, 1959