Microlithographic Assessment of a Novel Family of Transparent and Etch-Resistant Chemically Amplified 193-nm Resists Based on Cyclopolymers
- 9 October 2001
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 13 (11), 4147-4153
- https://doi.org/10.1021/cm010431w
Abstract
No abstract availableKeywords
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