Atomic force microscopy (AFM) and X-ray diffraction (XRD) investigations of copper thin films prepared by dc magnetron sputtering technique
- 31 October 2006
- journal article
- Published by Elsevier BV in Microelectronics Journal
- Vol. 37 (10), 1064-1071
- https://doi.org/10.1016/j.mejo.2006.04.008
Abstract
No abstract availableKeywords
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