Optical emission diagnostics and film growth during microwave-plasma-assisted diamond CVD
- 31 August 1996
- journal article
- Published by Elsevier BV in Diamond and Related Materials
- Vol. 5 (10), 1171-1184
- https://doi.org/10.1016/0925-9635(96)00537-7
Abstract
No abstract availableKeywords
This publication has 26 references indexed in Scilit:
- OES study of plasma processes in d.c. discharge during diamond film depositionDiamond and Related Materials, 1994
- Hydrogen atom yield in RF and microwave hydrogen dischargesPlasma Chemistry and Plasma Processing, 1994
- Spectroscopic analysis and chemical kinetics modeling of a diamond deposition plasma reactorDiamond and Related Materials, 1994
- Temperature Distributions Across the Plasma Layer of Planar Low Pressure Microwave Plasmas — A Comparative Investigation by Optical Emission SpectroscopyContributions to Plasma Physics, 1994
- Measurements of the gas kinetic temperature in a-discharge during the growth of diamondPhysical Review A, 1991
- Generation of diamond nuclei by electric field in plasma chemical vapor depositionApplied Physics Letters, 1991
- Optical Emission Diagnostic of a Low Pressure Planar Microwave Discharge for Plasmachemical DepositionContributions to Plasma Physics, 1991
- SpectrophysicsPublished by Springer Science and Business Media LLC ,1988
- Optical emission spectroscopy of reactive plasmas: A method for correlating emission intensities to reactive particle densityJournal of Applied Physics, 1980
- Radiative decay constants of the H2 Fulcher bandsThe Journal of Chemical Physics, 1978