Galvanostatic deposition and electrical characterization of cuprous oxide thin films
- 15 March 1992
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 209 (1), 92-96
- https://doi.org/10.1016/0040-6090(92)90015-4
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Electrodeposition and characterisation of cuprous oxide filmsMaterials Letters, 1991
- Chemically deposited Cu2O thin film as an oxygen pressure sensorThin Solid Films, 1988
- Cu2O solar cells: A reviewSolar Cells, 1988
- Electrical characteristics of Cu-Cu2O diodes fabricated by anodic oxidationJournal of Physics D: Applied Physics, 1988
- n–Vocdiagram and the physics of native interfacial layer of the Schottky barrierPhysica Scripta, 1988
- Potentiostatic electrodeposition of cuprous oxideThin Solid Films, 1988
- Galvanostatic deposition of thin films of cuprous oxideSolar Energy Materials, 1987
- Preparation, characteristics and photovoltaic properties of cuprous oxide—a reviewSolid-State Electronics, 1986
- Chemical deposition of Cu2O thin filmsThin Solid Films, 1985
- Adsorption of water on copper and cuprous oxideJournal of Vacuum Science and Technology, 1979