Concentration depth profiles by XPS; A new approach
- 1 July 1983
- journal article
- Published by Elsevier BV in Surface Science
- Vol. 129 (2-3), 355-365
- https://doi.org/10.1016/0039-6028(83)90186-3
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Background intensities in XPS spectra from homogeneous metalsSurface Science, 1983
- Influence of elastic and inelastic scattering on energy spectra of electrons emitted from solidsPhysical Review B, 1982
- The quantitative analysis of surfaces by XPS: A reviewSurface and Interface Analysis, 1980
- A secondary electron emission correction for quantitative auger yield measurementsSurface Science, 1980
- Quantitative depth profiling in surface analysis: A reviewSurface and Interface Analysis, 1980
- The depth resolution of sputter profilingApplied Physics A, 1979
- Zur bestimmung der reduzierten dicke D/λ dünner Schichten mittels XPSJournal of Electron Spectroscopy and Related Phenomena, 1978
- Linearized secondary-electron cascades from the surfaces of metals. I. Clean surfaces of homogeneous specimensPhysical Review B, 1977
- Linearized secondary-electron cascades from the surfaces of metals. II. Surface and subsurface sourcesPhysical Review B, 1977
- High-Resolution X-Ray Photoemission Spectrum of the Valence Bands of GoldPhysical Review B, 1972