Design and reliability challenges in nanometer technologies
Top Cited Papers
- 7 June 2004
- conference paper
- conference paper
- Published by Association for Computing Machinery (ACM)
Abstract
CMOS technology scaling is causing the channel lengths to be sub-wavelength of light. Parameter variation, caused by sub-wavelength lithography, will pose a major challenge for design and reliability of future high performance microprocessors in nanometer technologies. In this paper, we present the impact of these variations on processor functionality, predictability and reliability. We propose design and CAD solutions for variation tolerance. We conclude this paper with soft error rate scaling trends and soft error tolerant circuits for reliability enhancement.Keywords
This publication has 2 references indexed in Scilit:
- Parameter variations and impact on circuits and microarchitecturePublished by Association for Computing Machinery (ACM) ,2003
- Sub-90nm technologies2006 IEEE/ACM International Conference on Computer Aided Design, 2002