Sub-3 nm Co3O4 Nanofilms with Enhanced Supercapacitor Properties
- 26 January 2015
- journal article
- Published by American Chemical Society (ACS) in ACS Nano
- Vol. 9 (2), 1730-1739
- https://doi.org/10.1021/nn506548d
Abstract
Two-dimensional materials often show a range of intriguing electronic, catalytic, and optical properties that differ greatly from conventional nanoparticles. Herein, we demonstrate the large-scale preparation of sub-3 nm atomic layers Co3O4 nanofilms with a nonsurfactant and substrate-free hydrothermal method. This successful preparation of ultrathin nanofilms highlighted the reconstruction of cobalt-ammonia complexes and synergistic effect of free ammonia and nitrate on film growth control. Subsequent performance tests uncovered that these sub-3 nm atomic layer Co3O4 nanofilms exhibited an ultrahigh specific capacitance of 1400 F/g in the first galvanostatic charge/discharge test. The specific capacitance of Co3O4 nanofilms only slightly decayed less than 3% after 1500 cycling tests. With some parameter adjustments, similar Co(OH)2 nanofilms with a thickness of 3.70 ± 0.10 nm were also prepared. The Co(OH)2 nanofilms possessed maximum specific capacitance of 1076 F/g and peak performance attenuation of about 2% after a cycle stability test.Keywords
Funding Information
- National Natural Science Foundation of China (51125016, 51371119, 51472178)
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