SiO2/TiO2 thin films with variable refractive index prepared by ion beam induced and plasma enhanced chemical vapor deposition
- 1 April 2006
- journal article
- research article
- Published by Elsevier BV in Thin Solid Films
- Vol. 500 (1-2), 19-26
- https://doi.org/10.1016/j.tsf.2005.10.061
Abstract
No abstract availableKeywords
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