Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation
- 1 November 1991
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 70 (9), 4756-4759
- https://doi.org/10.1063/1.349067
Abstract
An experimental procedure has been developed to measure electron emission due to energetic ion bombardment during plasma source ion implantation. Spherical targets (radius=2 cm) of copper, stainless steel, graphite, titanium alloy (Ti‐6Al‐4V) and aluminum alloy (6061) were biased negatively to 20, 30, and 40 kV in argon and nitrogen plasmas. A Langmuir probe was used to detect the propagating sheath edge and a Rogowski transformer was used to measure the current to the target. The measurements of electron emission coefficients compare well with those measured under similar conditions [B. Szapiro and J. J. Rocca, J. Appl. Phys. 65, 3713 (1989)].Keywords
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