Effects of various Co/TiN and Co/Ti layer stacks and the salicide rapid thermal process conditions on cobalt silicide formation
- 31 October 2004
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 76 (1-4), 311-317
- https://doi.org/10.1016/j.mee.2004.07.049
Abstract
No abstract availableKeywords
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