Theoretical analysis of wafer temperature dynamics in a low pressure chemical vapor deposition reactor
- 30 November 1999
- journal article
- Published by Elsevier BV in International Journal of Heat and Mass Transfer
- Vol. 42 (22), 4131-4142
- https://doi.org/10.1016/s0017-9310(99)00069-1
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Optimal control of the wafer temperatures in diffusion/LPCVD reactorsAutomatica, 1992
- Modeling and control of the wafer temperatures in a diffusion furnaceJournal of Applied Physics, 1987
- Temperature Distribution and Stresses in Circular Wafers in a Row During Radiative CoolingJournal of Applied Physics, 1969
- Spectral Emissivity of SiliconJapanese Journal of Applied Physics, 1967