Pore size distributions in low‐k dielectric thin films from X‐ray porosimetry
Open Access
- 20 August 2002
- journal article
- research article
- Published by Wiley in Journal of Polymer Science Part B: Polymer Physics
- Vol. 40 (19), 2170-2177
- https://doi.org/10.1002/polb.10275
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Probing diffusion barrier integrity on porous silica low-k thin films using positron annihilation lifetime spectroscopyJournal of Applied Physics, 2001
- Determination of Pore Size in Mesoporous Thin Films from the Annihilation Lifetime of PositroniumThe Journal of Physical Chemistry B, 2001
- Structure and property characterization of low-k dielectric porous thin filmsJournal of Electronic Materials, 2001
- Determination of pore size distribution in thin films by ellipsometric porosimetryJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
- Determination of pore-size distribution in low-dielectric thin filmsApplied Physics Letters, 2000
- Properties of nanoporous silica thin films determined by high-resolution x-ray reflectivity and small-angle neutron scatteringJournal of Applied Physics, 2000
- Doppler broadening positron annihilation spectroscopy: A technique for measuring open-volume defects in silsesquioxane spin-on glass filmsApplied Physics Letters, 1999
- Simple liquids confined to molecularly thin layers. I. Confinement-induced liquid-to-solid phase transitionsThe Journal of Chemical Physics, 1998
- Subsurface profile refinement for neutron specular reflectivity (Invited Paper)Published by SPIE-Intl Soc Optical Eng ,1992
- Motions and Relaxations of Confined LiquidsScience, 1991