The influence of Bi-sticking coefficient in the growth of Bi(2212) thin film by ion beam sputtering
- 1 August 1996
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 281-282, 510-512
- https://doi.org/10.1016/0040-6090(96)08687-7
Abstract
No abstract availableKeywords
This publication has 1 reference indexed in Scilit:
- Vapor Pressures of Bismuth, Lead, and Copper Components in Bi2Sr1.7CaCu2Oy and Bi1.7Pb0.3Sr1.7Ca2Cu3Oy Superconductor CeramicsJournal of the American Ceramic Society, 1992