Comprehensive study of the resistivity of copper wires with lateral dimensions of 100 nm and smaller
- 27 December 2004
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 97 (2)
- https://doi.org/10.1063/1.1834982
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Electrical properties of superfilled sub-micrometer silver metallizationsJournal of Applied Physics, 2004
- Size-dependent resistivity of metallic wires in the mesoscopic rangePhysical Review B, 2002
- Resistivity Increase in Ultrafine-Line Copper Conductor for ULSIsJapanese Journal of Applied Physics, 2001
- Microstructural characterization of inlaid copper interconnect linesJournal of Electronic Materials, 2001
- Size effects in the electrical resistivity of polycrystalline nanowiresPhysical Review B, 2000
- Fabrication and Performance Limits of Sub-0.1 µm Cu InterconnectsMRS Proceedings, 2000
- Electrical-Resistivity Model for Polycrystalline Films: the Case of Arbitrary Reflection at External SurfacesPhysical Review B, 1970
- The mean free path of electrons in metalsAdvances in Physics, 1952
- The conductivity of thin metallic films according to the electron theory of metalsMathematical Proceedings of the Cambridge Philosophical Society, 1938