On the flow stability in vertical rotating disc MOCVD reactors under a wide range of process parameters
- 25 January 2006
- journal article
- Published by Elsevier BV in Journal of Crystal Growth
- Vol. 287 (2), 656-663
- https://doi.org/10.1016/j.jcrysgro.2005.10.131
Abstract
No abstract availableKeywords
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