Infrared optical properties of electron-beam evaporated silicon oxynitride films
- 15 October 1983
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 22 (20), 3204-3206
- https://doi.org/10.1364/ao.22.003204
Abstract
The complex dielectric function of SiO0.6N0.2 coatings, produced by reactive electron-beam deposition, was evaluated in the 5–50-μm range. The composition was determined by Rutherford backscattering spectrometry. The IR optical properties of the films make them well suited for radiative cooling applications.Keywords
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