Monitoring the Quality of Ultra-Pure Water in the Semiconductor Industry by Online Ion Chromatography
- 20 October 2005
- journal article
- Published by Springer Science and Business Media LLC in Microchimica Acta
- Vol. 154 (1), 15-20
- https://doi.org/10.1007/s00604-005-0427-3
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS, ICP-MS, and TXRFApplied Surface Science, 2004
- Determination of sodium at low ng/l concentrations in simulated power plant waters by ion chromatographyJournal of Chromatography A, 2003
- Computerized design of separation strategies by reversed-phase liquid chromatography: development of DryLab softwareJournal of Chromatography A, 2002
- Improving the detection limits for vapor phase decomposition-inductively coupled plasma mass spectrometry (VPD-ICP-MS) analysisJournal of Analytical Atomic Spectrometry, 2002
- Non-linear calibration functions in ion chromatography with suppressed conductivity detection using hydroxide eluentsJournal of Chromatography A, 2002
- Application of ion chromatography for the investigation of the anionic and cationic composition in high-purity water productionAnalytical and Bioanalytical Chemistry, 1999
- Calculation of detection limits for a single-laboratory ion-chromatographic method to determine parts-per-trillion ions in ultrapure waterJournal of Chromatography A, 1997
- Quantitation of anions at parts-per-trillion levels in semiconductor pure water by means of a laboratory ion chromatographJournal of Chromatography A, 1996