Aluminum-doped zinc oxide films grown by atomic layer deposition for transparent electrode applications
Open Access
- 19 April 2011
- journal article
- research article
- Published by Springer Science and Business Media LLC in Journal of Materials Science: Materials in Electronics
- Vol. 22 (12), 1810-1815
- https://doi.org/10.1007/s10854-011-0367-0
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Transparent and conductive undoped zinc oxide thin films grown by atomic layer depositionPhysica Status Solidi (a), 2010
- Electrical and optical properties of zinc oxide layers grown by the low-temperature atomic layer deposition techniquePhysica Status Solidi (b), 2010
- Luminescence from Zinc Oxide Nanostructures and Polymers and their Hybrid DevicesMaterials, 2010
- ZnO layers grown by Atomic Layer Deposition: A new material for transparent conductive oxideThin Solid Films, 2009
- Transparent conductors as solar energy materials: A panoramic reviewSolar Energy Materials and Solar Cells, 2007
- A comprehensive review of ZnO materials and devicesJournal of Applied Physics, 2005
- Characteristics of Organic Light Emitting Diodes with Al-Doped ZnO Anode Deposited by Atomic Layer DepositionJapanese Journal of Applied Physics, 2005
- Resistivity of polycrystalline zinc oxide films: current status and physical limitJournal of Physics D: Applied Physics, 2001
- Preparation of crystallized zinc oxide films on amorphous glass substrates by pulsed laser depositionJournal of Applied Physics, 1996
- Band-gap narrowing in heavily defect-doped ZnOPhysical Review B, 1982