Study of reflection power and surface roughness of Cu nanolayers thin film with respect to various deposition rates of sputtering
- 1 April 2007
- journal article
- Published by IOP Publishing in Journal of Physics: Conference Series
- Vol. 61, 1326-1330
- https://doi.org/10.1088/1742-6596/61/1/262
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
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- Residual stress and structural characteristics in Ti and Cu sputtered films on glass substrates at different substrate temperatures and film thicknessPhysica B: Condensed Matter, 2004
- Fractal Concepts in Surface GrowthPublished by Cambridge University Press (CUP) ,1995