Molecular Understanding of the Formation of Surface Zirconium Hydrides upon Thermal Treatment under Hydrogen of [(⋮SiO)Zr(CH2tBu)3] by Using Advanced Solid-State NMR Techniques
- 10 September 2004
- journal article
- research article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 126 (39), 12541-12550
- https://doi.org/10.1021/ja038486h
Abstract
The reaction of [(⋮SiO)Zr(CH2tBu)3] with H2 at 150 °C leads to the hydrogenolysis of the zirconium−carbon bonds to form a very reactive hydride intermediate(s), which further reacts with the surrounding siloxane ligands present at the surface of this support to form mainly two different zirconium hydrides: [(⋮SiO)3Zr−H] (1a, 70−80%) and [(⋮SiO)2ZrH2] (1b, 20−30%) along with silicon hydrides, [(⋮SiO)3SiH] and [(⋮SiO)2SiH2]. Their structural identities were identified by 1H DQ solid-state NMR spectroscopy as well as reactivity studies. These two species react with CO2 and N2O to give, respectively, the corresponding formate [(⋮SiO)4-xZr(O−C(O)H)x] (2) and hydroxide complexes [(⋮SiO)4-xZr(OH)x] (x = 1 or 2 for 3a and 3b, respectively) as major surface complexes.Keywords
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