Atomic Layer Deposition of SiO2 Films on BN Particles Using Sequential Surface Reactions
- 21 October 2000
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 12 (11), 3472-3480
- https://doi.org/10.1021/cm000313t
Abstract
No abstract availableThis publication has 27 references indexed in Scilit:
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