LEAKAGE CURRENT MECHANISM OF POLYCRYSTALLINE BiFeO3 FILMS WITH PT ELECTRODE

Abstract

Leakage current mechanism of the polycrystalline BiFeO₃ film annealing at 923 K with Pt electrodes was discussed based on Schottky-emission conduction, Poole-Frenkel trap limited conduction, Fowler-Nordheim tunneling conduction and space charge limited current (SCLC). The leakage current mechanism at room temperature is as follows; Schottky-emission or Poole-Frenkel was the candidate leakage current mechanism at low electric field and then leakage current mechanism was changed to the SCLC at high electric field. When decreasing the measuring temperature, the leakage current mechanism at low electric field was Poole-Frenkel trap limited conduction, though the electric field region of the PF trap limited conduction was much broader than that of the room temperature.