Photolithography with polymethyl methacrylate (PMMA)
- 21 December 2015
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
Abstract
No abstract availableThis publication has 38 references indexed in Scilit:
- Electron beam lithography in nanoscale fabrication: recent developmentIEEE Transactions on Electronics Packaging Manufacturing, 2003
- Polymers in nanotechnologyCurrent Opinion in Solid State and Materials Science, 2002
- Fabrication of high-density nanostructures by electron beam lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- An anthracene-containing PMMA derivative for photoresist and channel waveguide applicationsThin Solid Films, 1996
- Electron beam lithography—Resolution limitsMicroelectronic Engineering, 1996
- Photodegradation of poly(methyl methacrylate) by monochromatic light: Quantum yield, effect of wavelengths, and light intensityJournal of Applied Polymer Science, 1990
- Polymers in electron beam and X-Ray lithographyProgress in Polymer Science, 1983
- Replication of 175-Å lines and spaces in polymethylmethacrylate using x-ray lithographyApplied Physics Letters, 1980
- Polymeric Resists for X-Ray LithographyJournal of the Electrochemical Society, 1974
- DEGRADATION OF POLYMETHYL METHACRYLATE BY ULTRAVIOLET LIGHTThe Journal of Physical Chemistry, 1961