Magnetron sputtering: a review of recent developments and applications
- 1 March 2000
- journal article
- review article
- Published by Elsevier BV in Vacuum
- Vol. 56 (3), 159-172
- https://doi.org/10.1016/s0042-207x(99)00189-x
Abstract
No abstract availableThis publication has 46 references indexed in Scilit:
- MoS2/metal composite coatings deposited by closed-field unbalanced magnetron sputtering: tribological properties and industrial usesSurface and Coatings Technology, 1999
- Mid frequency sputtering with TwinMag®-a survey of recent resultsVacuum, 1998
- Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering systemJournal of Vacuum Science & Technology A, 1998
- Substrate effects from an unbalanced magnetronThin Solid Films, 1990
- Unbalanced dc magnetrons as sources of high ion fluxesJournal of Vacuum Science & Technology A, 1986
- Unbalanced magnetron ion-assisted deposition and property modification of thin filmsJournal of Vacuum Science & Technology A, 1986
- Revised structure zone model for thin film physical structureJournal of Vacuum Science & Technology A, 1984
- High‐rate sputtering of aluminum for metallization of integrated circuitsJournal of Vacuum Science and Technology, 1977
- Deposition rate and substrate temperature effects on the structure and properties of bulk-sputtered OFHC Cu and Cu–O.15 ZrJournal of Vacuum Science and Technology, 1975
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974