Si(100) Surface under an Externally Applied Stress

Abstract

Loading a cantilevered bar allows studying the effect of a uniform, externally applied, and continuously variable strain field on the properties of surfaces. Straining a nominally flat Si(100) surface produces unequal populations of the 2 × 1 and 1 × 2 domains. The domain compressed along the dimer bond is favored. The effect depends on the strain and not the strain gradient. The effect saturates at a strain of 0.1% when 90% of the surface is in the favorable domain. The kinetics of developing and annealing away the asymmetry are identical and thermally activated.