Integration of multi-microelectrode and interface circuits by silicon planar and three-dimensional fabrication technology
- 31 January 1984
- journal article
- Published by Elsevier BV in Sensors and Actuators
- Vol. 5 (1), 89-99
- https://doi.org/10.1016/0250-6874(84)87009-2
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- The Controlled Etching of Silicon in Catalyzed Ethylenediamine‐Pyrocatechol‐Water SolutionsJournal of the Electrochemical Society, 1979
- The Fabrication of High Precision Nozzles by the Anisotropic Etching of (100) SiliconJournal of the Electrochemical Society, 1978
- A Low-Capacitance Multielectrode Probe for Use in Extracellular NeurophysiologyIEEE Transactions on Biomedical Engineering, 1975
- An Evaluation of Photoengraved Microelectrodes for Extracellular Single-Unit RecordingIEEE Transactions on Biomedical Engineering, 1973
- Development, Operation, and Application of the Ion-Sensitive Field-Effect Transistor as a Tool for ElectrophysiologyIEEE Transactions on Biomedical Engineering, 1972
- An Integrated-Circuit Approach to Extracellular MicroelectrodesIEEE Transactions on Biomedical Engineering, 1970
- Low frequency noise in MOS transistors—I TheorySolid-State Electronics, 1968