Focused ion beam induced deposition of low-resistivity copper material
- 1 November 2004
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 22 (6), 3000-3003
- https://doi.org/10.1116/1.1826065
Abstract
No abstract availableKeywords
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- Selective metal deposition using low-dose focused ion-beam patterningPublished by SPIE-Intl Soc Optical Eng ,1991
- Focused ion beam induced deposition of platinum for repair processesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Focused ion beam induced deposition of low-resistivity gold filmsJournal of Vacuum Science & Technology B, 1989
- Focused-Ion-Beam Induced Deposition Of Metal For Microcircuit ModificationPublished by SPIE-Intl Soc Optical Eng ,1989