On the electron energy in the high power impulse magnetron sputtering discharge
- 15 June 2009
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 105 (12), 123302
- https://doi.org/10.1063/1.3151953
Abstract
The temporal variation of the electron energy distribution function (EEDF) was measured with a Langmuir probe in a high power impulse magnetron sputtering (HiPIMS) discharge at 3 and 20 mTorr pressures. In the HiPIMS discharge a high power pulse is applied to a planar magnetron giving a high electron density and highly ionized sputtered vapor. The measured EEDF is Maxwellian-like during the pulse; it is broader for lower discharge pressure and it becomes narrower as the pulse progresses. This indicates that the plasma cools as the pulse progresses, probably due to high metal content of the discharge.Keywords
This publication has 20 references indexed in Scilit:
- Ion composition produced by high power impulse magnetron sputtering discharges near the substrateJournal of Applied Physics, 2008
- Plasma parameters in a planar dc magnetron sputtering discharge of argon and kryptonJournal of Physics: Conference Series, 2008
- Ionized physical vapor deposition (IPVD): magnetron sputtering dischargesJournal of Physics: Conference Series, 2008
- Ion flux characteristics in high-power pulsed magnetron sputtering dischargesEurophysics Letters, 2007
- The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering dischargeThin Solid Films, 2006
- Plasma dynamics in a highly ionized pulsed magnetron dischargePlasma Sources Science and Technology, 2005
- Measurements of electron energy distribution functions and electron transport in the downstream region of an unbalanced dc magnetron dischargePlasma Sources Science and Technology, 2004
- Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron dischargeApplied Physics Letters, 2001
- Ionized sputter deposition using an extremely high plasma density pulsed magnetron dischargeJournal of Vacuum Science & Technology A, 2000
- Observation of two-temperature electrons in a sputtering magnetron plasmaJournal of Vacuum Science & Technology A, 1991