Structural Comparison of Hydrogen Silsesquioxane Based Porous Low-k Thin Films Prepared with Varying Process Conditions
- 28 March 2002
- journal article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (4), 1845-1852
- https://doi.org/10.1021/cm011569h
Abstract
No abstract availableThis publication has 23 references indexed in Scilit:
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