Realizing ferroelectric Hf0.5Zr0.5O2 with elemental capping layers
Open Access
- 21 December 2017
- journal article
- research article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 36 (1)
- https://doi.org/10.1116/1.5002558
Abstract
Hafnium zirconium oxide (Hf0.5Zr0.5O2 or HZO) thin films show great promise for enabling ferroelectric field-effect transistors (FeFETs) for memory applications and negative capacitance FETs for low-power digital devices. One challenge in the integration of ferroelectric HZO is the need for specific capping layers to yield the most pronounced ferroelectric behavior; to date, superior HZO devices use titanium nitride or tantalum nitride, which limits HZO integration into various device structures. In this work, the authors demonstrate the use of elemental capping layers, including Pt, Ni, and Pd, for driving ferroelectricity in HZO. Different combinations of these capping metals, along with changes in the HZO thickness and annealing conditions, have yielded the optimal conditions for maximizing ferroelectric behavior. A remnant polarization of 19 μC/cm2 and a coercive field strength of 1.07 MV/cm were achieved with the Pt/HZO/Ni stack annealed at 650 °C with a HZO thickness of ∼20 nm. These results bring even greater promise to the use of HZO in memory and/or digital electronic devices by expanding the toolkit of materials that may be used for realizing ferroelectricity.Keywords
Funding Information
- National Science Foundation (Grant ECCS-1656240)
This publication has 38 references indexed in Scilit:
- Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodesPhysica Status Solidi (RRL) – Rapid Research Letters, 2014
- Reliability Characteristics of Ferroelectric $ \hbox{Si:HfO}_{2}$ Thin Films for Memory ApplicationsIEEE Transactions on Device and Materials Reliability, 2012
- Ferroelectricity in Simple Binary ZrO2 and HfO2Nano Letters, 2012
- Experimental confirmation of temperature dependent negative capacitance in ferroelectric field effect transistorApplied Physics Letters, 2012
- 64 kbit Ferroelectric-Gate-Transistor-Integrated NAND Flash Memory with 7.5 V Program and Long Data RetentionJapanese Journal of Applied Physics, 2012
- 64 kbit Ferroelectric-Gate-Transistor-Integrated NAND Flash Memory with 7.5 V Program and Long Data RetentionJapanese Journal of Applied Physics, 2012
- Ferroelectricity in hafnium oxide thin filmsApplied Physics Letters, 2011
- Use of Negative Capacitance to Provide Voltage Amplification for Low Power Nanoscale DevicesNano Letters, 2007
- End of Moore's law: thermal (noise) death of integration in micro and nano electronicsPhysics Letters A, 2002
- FeRAM technology for high density applicationsMicroelectronics Reliability, 2001