Evolution of a Surface-Roughness Spectrum Caused by Stress in Nanometer-Scale Chemical Etching
- 8 November 1999
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 83 (19), 3872-3875
- https://doi.org/10.1103/physrevlett.83.3872
Abstract
It is reported that a flat free surface of a stressed solid is configurationally unstable under chemical etching and the surface roughness grows with different rates for different spatial frequencies. The theory described in this Letter predicts that with a shallow chemical etching the roughness with spatial frequency below a critical value grows while the roughness of higher frequency decays. The theory was verified via an atomic force microscope experiment with aluminum. This study provides a simple experimental method to measure stress in metals and ceramics.Keywords
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