Absence of resolution degradation in X-ray lithography for λ from 4.5nm to 0.83nm
- 30 April 1990
- journal article
- Published by Elsevier BV in Microelectronic Engineering
- Vol. 11 (1-4), 317-321
- https://doi.org/10.1016/0167-9317(90)90122-a
Abstract
No abstract availableKeywords
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