Photoelectrochemical etching to fabricate single-crystal SiC MEMS for harsh environments
- 15 February 2011
- journal article
- research article
- Published by Elsevier BV in Materials Letters
- Vol. 65 (3), 409-412
- https://doi.org/10.1016/j.matlet.2010.10.034
Abstract
No abstract availableKeywords
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