Thermal detection mechanism of SiC based hydrogen resistive gas sensors

Abstract
Siliconcarbide(SiC)resistive hydrogen gas sensors have been fabricated and tested. Planar NiCr contacts were deposited on a thin 3 C - Si C epitaxialfilmgrown on thin Si wafers bonded to polycrystalline SiC substrates. At 673 K , up to a 51.75 ± 0.04 % change in sensor output current and a change in the device temperature of up to 163.1 ± 0.4 K were demonstrated in response to 100% H 2 in N 2 . Changes in device temperature are shown to be driven by the transfer of heat from the device to the gas, giving rise to a thermal detection mechanism.