Hole conduction and valence-band structure of Si3N4 films on Si
- 15 August 1975
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 27 (4), 254-255
- https://doi.org/10.1063/1.88413
Abstract
Transport measurements were performed on thin films of Si3N4 deposited on Si using carrier injection from low‐energy corona ions and a shallow junction detector. Large hole conduction is found for both corona polarities. Examination of the electronic structure of Si3N4 by x‐ray photoemission spectroscopy (XPS or ESCA) reveals one broad structure 10 eV wide (FWHM) at the top of the valence bands which results from the bonding of the Si 3s, Si 3p, and N 2p orbitals. This finding is consistent with the hole conduction we observe. The XPS results are compared with those from amorphous SiO2. The tops of the valence band of Si3N4 and SiO2 are found to lie 1.5±0.2 eV and 4.5±0.2 eV, respectively, below the Fermi level of a thin overlayer of gold.Keywords
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