Diffusion of ion-implanted boron impurities into pre-amorphized silicon
- 30 June 2000
- journal article
- Published by Elsevier BV in Materials Science in Semiconductor Processing
- Vol. 3 (3), 221-225
- https://doi.org/10.1016/s1369-8001(00)00036-6
Abstract
No abstract availableKeywords
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