Analysis of nano-grating-assisted light absorption enhancement in metal–semiconductor–metal photodetectors patterned using focused ion-beam lithography
- 15 March 2011
- journal article
- Published by Elsevier BV in Optics Communications
- Vol. 284 (6), 1694-1700
- https://doi.org/10.1016/j.optcom.2010.11.065
Abstract
No abstract availableKeywords
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