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High-aspect-ratio Si etching for microsensor fabrication
Home
Publications
High-aspect-ratio Si etching for microsensor fabrication
High-aspect-ratio Si etching for microsensor fabrication
WJ
W. H. Juan
W. H. Juan
S. W. Pang
S. W. Pang
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1 May 1995
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 13
(3)
,
834-838
https://doi.org/10.1116/1.579837
Abstract
No abstract available
Keywords
HIGH ASPECT RATIO
MICROSENSOR FABRICATION
SI ETCHING
RATIO SI
Cited by 21 articles