Fabrication of SAW devices using SEM-based electron beam lithography and lift-off technique for lab use
- 19 April 2005
- conference paper
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- SAW reflection characteristics of Cu electrodes and their application to SAW IF devicesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Overview of design challenges for single phase unidirectional SAW filtersPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- SHF-range surface acoustic wave interdigital transducers using electron beam exposurePublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- GHz-range SAW device using nano-meter electrode fabrication technologyPublished by Institute of Electrical and Electronics Engineers (IEEE) ,1994