Planar microwave devices fabricated by ion‐implantation patterning of high‐temperature superconductors

Abstract

We have applied ion‐implantation inhibit patterning as a new method of fabricating low‐loss microwave transmission lines in high‐temperature superconductor thin films. To determine the effectiveness of this technique, we fabricated coplanar waveguide transmission lines in YBa₂Cu₃O_7−δ thin films that had been deposited on LaAlO₃ substrates using pulsed laser deposition. Microwave characterizations of these lines are compared to a reference line fabricated with conventional ion milling. At 76 K and 12 GHz, the attenuation constants of the ion‐implanted transmission lines are approximated 0.02 dB/mm, and the overall loss response is indistinguishable from that of the ion‐milled device.