Sputter deposition of crystalline alumina coatings
- 30 January 2003
- journal article
- Published by Elsevier BV in Surface and Coatings Technology
- Vol. 163-164, 157-163
- https://doi.org/10.1016/s0257-8972(02)00480-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputteringSurface and Coatings Technology, 1999
- Deposition of hard crystalline Al2O3 coatings by bipolar pulsed d.c. PACVDSurface and Coatings Technology, 1998
- Thermal stability of Al–O–N PVD diffusion barriersSurface and Coatings Technology, 1998
- Crystalline alumina deposited at low temperatures by ionized magnetron sputteringJournal of Vacuum Science & Technology A, 1997
- Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputteringSurface and Coatings Technology, 1996
- Reactive sputter deposition of alumina films on superalloys and their high-temperature corrosion resistanceSurface and Coatings Technology, 1995
- Properties of magnetron-sputtered electrically insulating Al2O3 coatings on copperJournal of Materials Science, 1992
- Alumina films by sputter deposition with Ar/O2: Preparation and characterizationJournal of Vacuum Science & Technology A, 1989