Nucleation and growth of the nanostructured anodic oxides on tantalum and niobium under the porous alumina film
- 1 September 2003
- journal article
- Published by Elsevier BV in Electrochimica Acta
- Vol. 48 (20-22), 3155-3170
- https://doi.org/10.1016/s0013-4686(03)00345-1
Abstract
No abstract availableKeywords
This publication has 24 references indexed in Scilit:
- Geometry and element composition of a nanoscale field emission array formed by self-organization in porous anodic aluminum oxideSolid-State Electronics, 2001
- Nucleation of Metals on Aluminum by Laser Irradiation and the Effect on Ni‐P Electroless DepositionJournal of the Electrochemical Society, 1999
- Anodic process for forming nanostructured metal-oxide coatings for large-value precise microfilm resistor fabricationElectrochimica Acta, 1999
- Planar aluminum interconnection formed by electrochemical anodizing techniqueMicroelectronic Engineering, 1997
- Anisotropy of Porous Anodization of Aluminum for VLSI TechnologyJournal of the Electrochemical Society, 1994
- Anodic Processing for Multilevel LSIJournal of the Electrochemical Society, 1976
- An Anodic Process for Forming Planar Interconnection Metallization for Multilevel LSIJournal of the Electrochemical Society, 1975
- Transport Numbers of Metal and Oxygen during the Anodic Oxidation of TantalumJournal of the Electrochemical Society, 1973
- The Migration of Oxygen during the Anodic Oxidation of TantalumJournal of the Electrochemical Society, 1973
- Ionic Conductivity of Tantalum Oxide at Very High FieldsPhysical Review B, 1956