dc reactive magnetron sputtering of titanium-structural and optical characterization of TiO2 films
- 1 February 1992
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 71 (3), 1421-1427
- https://doi.org/10.1063/1.351264
Abstract
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variation in cathode potential as a function of oxygen partial pressure has been explained in terms of cathode poisoning effects. The titania films deposited during this process have been studied for their structural and optical characteristics. The effect of substrate temperature (from 25 to 400 °C) and annealing (from 250 to 700 °C) on the packing density, refractive index, extinction coefficient, and crystallinity has been investigated. The refractive index varied from 2.24 to 2.46 and extinction coefficient from 2.6 × 10−3 to 10.4× 10−3 at 500 nm as the substrate temperature increased from 25 to 400 °C. The refractive index increased from 2.19 to 2.35 and extinction coefficient changed from 3.2× 10−3 to 11.6 × 10−3 at 500 nm as the annealing temperature was increased from 250 to 700 °C. Anatase and rutile phases have been observed in the films deposited at 400 °C substrate temperature and annealed at 300 °C. The changes in the optical constants at higher substrate temperature have been attributed to an increase in packing density, oxygen content, and crystallinity of the films.Keywords
This publication has 27 references indexed in Scilit:
- Studies on glow-discharge characteristics during dc reactive magnetron sputteringJournal of Applied Physics, 1991
- Optical properties of electron-beam evaporated TiO2 films deposited in an ionized oxygen mediumJournal of Vacuum Science & Technology A, 1990
- A physical model for eliminating instabilities in reactive sputteringJournal of Vacuum Science & Technology A, 1988
- Modeling of reactive sputtering of compound materialsJournal of Vacuum Science & Technology A, 1987
- Activated reactive evaporation of TiO2 layers and their absorption indicesThin Solid Films, 1980
- Reactively sputtered oxide optical coatings for inertial confinement fusion laser componentsThin Solid Films, 1979
- Refractive indices of TiO_2 films produced by reactive evaporation of various titanium–oxygen phasesApplied Optics, 1976
- Synthesis of various oxides in the Ti−O system by reactive evaporation and activated reactive evaporation techniquesJournal of Vacuum Science and Technology, 1975
- Reactive Evaporation in Ionized GasesApplied Optics, 1971
- Deposition of Oxide Films by Reactive EvaporationJournal of Vacuum Science and Technology, 1966