Infrared absorption and bonding in amorphous hydrogenated silicon-carbon alloys
- 14 September 1985
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 18 (9), 1935-1948
- https://doi.org/10.1088/0022-3727/18/9/023
Abstract
Films of a-Si1-xCx:H were prepared by DC magnetron glow discharge decomposition of silane-methane-gas mixtures. The infrared absorption coefficient was studied using a reflection method in the range 650-4000 cm-1 as a function of the fraction of methane in the gas mixture and as a function of substrate temperature. The results enabled assignments of the hydrogen-related absorption features to be made. At a substrate temperature of 478 degrees C the silicon-hydrogen stretching mode split into three bands. The silicon-carbon stretching mode was used to estimate the degree of heteronuclear bonding. It was shown that heteronuclear bonding increased with substrate temperature and was accompanied by useful increases in the photoconductivity of the films.Keywords
This publication has 23 references indexed in Scilit:
- Ion bombardment effects in plasma deposition of hydrogenated amorphous silicon carbide films: A comparative study of d.c. and r.f. dischargesThin Solid Films, 1983
- Bonding in hydrogenated hard carbon studied by optical spectroscopySolid State Communications, 1983
- Optical and electrical properties of a-SixC1−x:H films prepared by glow discharge from SiH4 and C2H4Solar Energy Materials, 1983
- Structure, optical properties and decomposition kinetics of sputtered hydrogenated carbonThin Solid Films, 1982
- Recent developments in amorphous silicon solar cellsSolar Energy Materials, 1980
- Infrared absorption of hydrogenated amorphous SiC and GeC filmsThin Solid Films, 1980
- Chemical effects on the frequencies of Si-H vibrations in amorphous solidsSolid State Communications, 1979
- Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputteringPhysical Review B, 1977
- Electrical and optical properties of amorphous silicon carbide, silicon nitride and germanium carbide prepared by the glow discharge techniquePhilosophical Magazine, 1977
- FORMATION OF SiC IN SILICON BY ION IMPLANTATIONApplied Physics Letters, 1971