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Preparation and characterization of reactively sputtered SiCxNy films
Home
Publications
Preparation and characterization of reactively sputtered SiCxNy films
Preparation and characterization of reactively sputtered SiCxNy films
SK
S Komatsu
S Komatsu
YH
Y Hirohata
Y Hirohata
SF
S Fukuda
S Fukuda
TH
T Hino
T Hino
TY
T Yamashina
T Yamashina
TH
T Hata
T Hata
KK
K Kusakabe
K Kusakabe
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1 December 1990
journal article
Published by
Elsevier BV
in
Thin Solid Films
Vol. 193-194
,
917-923
https://doi.org/10.1016/0040-6090(90)90245-9
Abstract
No abstract available
Keywords
SICXNY FILMS
SPUTTERED SICXNY
REACTIVELY SPUTTERED
PREPARATION AND CHARACTERIZATION
Cited by 20 articles