A Level Set Approach to a Unified Model for Etching, Deposition, and Lithography I: Algorithms and Two-Dimensional Simulations
- 31 August 1995
- journal article
- Published by Elsevier BV in Journal of Computational Physics
- Vol. 120 (1), 128-144
- https://doi.org/10.1006/jcph.1995.1153