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UV Curing Nanoimprint Lithography for Uniform Layers and Minimized Residual Layers
Home
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UV Curing Nanoimprint Lithography for Uniform Layers and Minimized Residual Layers
UV Curing Nanoimprint Lithography for Uniform Layers and Minimized Residual Layers
HL
Heon Lee
Heon Lee
Gun-Young Jung
Gun-Young Jung
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9 December 2004
journal article
Published by
IOP Publishing
in
Japanese Journal of Applied Physics
Vol. 43
(12)
,
8369-8373
https://doi.org/10.1143/jjap.43.8369
Abstract
No abstract available
Cited by 35 articles