On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films
- 23 December 2001
- journal article
- Published by Elsevier BV in Thin Solid Films
- Vol. 402 (1-2), 154-161
- https://doi.org/10.1016/s0040-6090(01)01685-6
Abstract
No abstract availableKeywords
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